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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-788
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-115
filingDate 2007-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2314db210db76778fb8930846cfc9eda
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cdfcc7e54b6265e3cf7f827452f0d86d
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publicationDate 2008-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-200810132-A
titleOfInvention Non-volatile memory and operating method thereof
abstract A non-volatile memory disposed in the silicon on insulation substrate is provided. The non-volatile memory has a memory cell and a first conductive type doped region. The memory cell has a gate, a charge storage structure, a bottom dielectric layer, a second conductive type drain region and a second conductive type source region. The gate is disposed on the silicon on insulation substrate. The charge storage structure is disposed between the gate and the silicon on insulation substrate. The bottom dielectric layer is disposed between the charge storage layer and the silicon on insulation substrate. The second conductive type drain region and the second conductive type source region are disposed in a first conductive type silicon body layer next to the two sides of the gate. The first conductive type doped region is disposed in the first conductive type silicon body layer and electrically connected to the first conductive type silicon body layer beneath the gate.
priorityDate 2006-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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