http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200808134-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c1e0fc105cdaa6fc6208bcc48eadab50 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05G2-003 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05G2-005 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G21K5-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03B27-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05G2-00 |
| filingDate | 2007-05-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_783ea012c10fe36942d571cc6aca9670 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e16ea10a7a2109476fc59abaab4aacea http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_837c9440d39b1f391f9c20636d97d50e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cc38516e83239e24e99be1287bc68f65 |
| publicationDate | 2008-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-200808134-A |
| titleOfInvention | Light source device for producing extreme ultraviolet radiation and method of generating extreme ultraviolet radiation |
| abstract | Electrode ablation is controlled in EUV light source device that gasifies a raw material by irradiation with an energy beam and produces a high-temperature plasma using electrodes. A raw material for plasma is dripped in a space in the vicinity of, but other than, the discharge region and from which the gasified raw material can reach the discharge region between the discharge electrodes and a laser beam irradiates the high-temperature plasma raw material. A gasified high-temperature plasma raw material, gasified by the laser beam, spreads in the direction of the discharge region. At this time, power is applied on a pair of discharge electrodes, the gasified high-temperature plasma raw material is heated and excited to become a high-temperature plasma, and EUV radiation is emitted. This EUV radiation is collected by an EUV collector mirror and sent to lithography equipment. |
| priorityDate | 2006-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419544408 |
Total number of triples: 18.