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publicationDate 2008-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-200807574-A
titleOfInvention Method of forming an integrated circuit
abstract A method of forming an integrated circuit includes: defining a plurality of protruding portions on a semiconductor substrate surface, the protruding portions having a minimum height; providing a pattern layer above the substrate surface; removing portions of the pattern layer from predetermined substrate portions; performing an ion implantation procedure such that an angle of the ions with respect to the substrate surface is less than 90 DEG, wherein the ions are stopped by the pattern layer and by the protruding portions, the predetermined substrate portions thereby being doped with the ions; and removing the pattern layer.
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