| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ee1c19da359446fb5c4f0458a57b783d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_41e00307d71a7333061f80cc9032f076 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-426
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31133
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-5018
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate |
2007-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f2ea73e7c5ee8a77c1fb87debd1a8964
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_04e092c5c4efa225560d42aa9d024262 |
| publicationDate |
2008-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200805005-A |
| titleOfInvention |
Device substrate washing method |
| abstract |
Disclosed is a device substrate washing method which can fully remove a resist attached to a device substrate, particularly a resist attached to a perforated part of a fine pattern which has a large aspect ratio. The method comprises a washing step for removing a resist attached to a device substrate with a solvent, wherein the solvent is a composition comprising at least one fluorinated compound selected from the group consisting of hydrofluoroether, hydrofluorocarbon and perfluorocarbon and a fluorinated alcohol. |
| priorityDate |
2006-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |