http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200804982-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2007-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6f89ea907e1c9b69e680775bb47d4fd5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d440d033ae0157466be2cebc09a5df7e |
| publicationDate | 2008-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-200804982-A |
| titleOfInvention | Radiation-sensitive positive resin composition for producing platings, transfer film, and process for producing platings |
| abstract | A radiation-sensitive positive resin composition is excellent in sensitivity, resolution and adhesion to a substrata and is developed to form clear apertures without residues. The composition does not contaminate a plating solution and is capable of forming a resin film (resist) that is resistant to cracks after plating, resistant to indentation by platings, and resistant to lifting. A transfer film has the composition. A process of the invention produces thick platings as bumps or wirings with high precision. The radiation-sensitive positive resin composition for producing platings includes a polymer (A) that has at least one end terminated with -SR (wherein R is a linear or branched alkyl group of 1 to 20 carbon atoms, a cyclic alkyl group of 3 to 20 carbon atoms, or a derivative thereof) and includes a structural unit having an acid-dissociative functional group which is dissociated by an acid to yield an acidic functional group; a radiation-sensitive acid generator (S); and an organic solvent (C). |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110383170-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110383170-A |
| priorityDate | 2006-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 264.