| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-7684
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate |
2007-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_00a1ae069468972ea8fadd6146982f16 |
| publicationDate |
2008-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200804578-A |
| titleOfInvention |
Selective barrier slurry for chemical mechanical polishing |
| abstract |
The present invention provides an aqueous polishing composition useful for polishing semiconductor substrates. The composition comprises 0.05 to 50 weight percent abrasive and 0.001 to 5 weight percent iota type carrageenan. The iota type carrageenan has a concentration useful for accelerating the removal rate of tantalum, tantalum nitride and other tantalum-containing materials. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11001732-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I453272-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109153889-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109153889-B |
| priorityDate |
2006-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |