| abstract |
These is provided a detergent or a rinsing agent for lithography, which has good solubility, stripping ability to resist made from solution of organic solvent, anti-reflective film or photo-spacer. The detergent or a rinsing agent is characterized by containing cycloalkanol acetate that can have substituent groups. Furthermore, it also can contain monopropylene glycol alkyl ether, diprophene glycol alkyl ether, tripropylene glycol alkyl ether, monopropylene glycol alkyl ehter acetate, dipropylene glycol alkyl ether acetate, tripropylene glycol alkyl ether acetate, 1,3-butanediol alkyl ether, 1,3-butanediol alkyl ehter acetate, glycerin alkyl ether, and glycerin alkyl ether acetate, etc. as its organic solvent. |