| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7a37d7a7385924dd55e29ac1e96d1492 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24355 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K1-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K1-097
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B5-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B1-22 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D5-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K1-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D11-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D11-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B22F9-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82Y99-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B5-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82Y30-00 |
| filingDate |
2006-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d64640cb653f1831f55bd11f1899a1e0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d35733dfb4fe88394d024134fe8fc678
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4edbd49d7b5d013f1332284c37f3eb70 |
| publicationDate |
2007-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200724620-A |
| titleOfInvention |
Nickel ink and conductive film prepared from the same |
| abstract |
This invention discloses a nickel ink that disperses nickel particles in a dispersion medium. The dispersion medium is chosen from one or the combination of more than two of alcohols and glycols with a boiling point lower than 300℃ at normal pressure. The average diameter of the nickel particles is below 50nm. A conductive film formed from the nickel ink provides a smooth surface that the average surface roughness (Ra) is below 10nm, and the maximum surface roughness (Rmax) is below 200nm. |
| priorityDate |
2005-11-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |