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filingDate 2006-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4b4d423e3fa983b099420c2d380eaa75
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publicationDate 2007-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-200722922-A
titleOfInvention Film-forming composition, and pattern forming method and three-dimensional mold using the same
abstract Disclosed are a film-forming composition which can form a pattern having an enhanced contrast by the action of uneven surface morphology produced after image development, and a method for forming a pattern and a three-dimensional mold using the composition. A composition comprising at least one of a hydrolysate and a condensation product of an alkoxy metal compound represented by the chemical formula (A), the composition additionally comprising a compound which can respond to at least one of light and heat to control the solubility of a finished film in a developing solution. R1n-M(OR2)4-n…(A), wherein M represents a silicon, a germanium, a titanium, a tantalum, an indium or a tin; R1 represents hydrogen atom or a monovalent organic group; R2 represents a monovalent organic group; and n represents an integer of 1 to 3.
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