http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200719441-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ddbd9538efce6e134d471b912946264e |
filingDate | 2006-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a77a9d0e4baff7733029a83f3ea744a6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e9a6f57dd45969946c216e53c218021b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c803ca65a8aa16be19594972fcc1ccb3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee0718d6d888b4dcd73511469fddeac1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dfc78ba208f318015cbc7b23bfe10ee0 |
publicationDate | 2007-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | TW-200719441-A |
titleOfInvention | Method and structure for fabricating non volatile memory arrays |
abstract | An MONOS integrated circuit device is provided. The device has a semiconductor substrate, and a shallow trench isolation region is formed within the substrate. A P-type well region is formed within the substrate and adjacent to the shallow trench isolation region. A first word gate includes a first edge, a second edge, a first control gate and a second control gate. A second word gate includes a first edge, a second edge, a first control and a second control gate. A common buried bit line is formed within the P-type well region. An HDP plasma dielectric is formed overlying the common buried bitline. The device has a planarized surface. A word line is overlying the planarized surface. The word line is coupled to the first word gate and the second word gate. The device further has a refractory metal layer, a hard mask layer and a cap layer. |
priorityDate | 2005-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Predicate | Subject |
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isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID450646340 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID176015 |
Total number of triples: 15.