http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200705103-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F290-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2006-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_07b43da48ef418183bdbf4f2833704be http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0c37a8e1d2c7d3335d3d2854c8a8d564 |
| publicationDate | 2007-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-200705103-A |
| titleOfInvention | Curing accelerator, thermosetting resin composition, photo-sensitive composition and photo-sensitive film, permanent pattern and process for forming the same |
| abstract | The invention provides a curing accelerator having excellent storage stability without causing a reaction during storage at normal temperature, of which the curing-accelerating efficiency and the heat cross-linking efficiency by means of heating could be found and good film hardness of a curing film could be obtained by initialing a reaction among epoxy resin compounds and the like and curing them; a thermosetting resin composition obtained by using the said curing accelerator, which is possibly cured by heating and can found excellent storage stability and excellent chemicals-resistance, hardness, dielectric characteristics, electrical insulating property and so on after curing; a photo-sensitive composition obtained by using the aforesaid curing accelerator, which is possibly forming an image by UV exposing, tack property of surface is small, laminating property and treating quality are good, excellent storage stability, high sensitivity, excellent developing property and can found excellent chemicals-resistance, surface hardness, heat resistance, dielectric characteristics, electrical insulating property and so on after curing; a photo-sensitive film using the composition, as well as provides a permanent pattern with high fineness and a process for efficiently forming thereof. A curing accelerator is characterized in it is a structure that produces an amine by external stimulation and has a ratio of 1:1 of carboxyl group to amide group in the molecule. Further, a thermosetting resin composition at least comprises a epoxy resin compound and the aforesaid curing accelerator of the invention. Furthermore, a photo-sensitive composition at least comprises a polymer having 1 or more carboxyl groups and any of ester group in 1 molecule, a polymerizable compound, a photo polymerization initiator, a heat cross-linking agent and the aforesaid curing accelerator of the invention; as well as a permanent pattern with high fineness and a process for efficiently forming thereof. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103324029-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103324029-B |
| priorityDate | 2005-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458397365 |
Total number of triples: 24.