| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_129e393582e6bdf4029baf2206522f45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-42 |
| filingDate |
2005-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1cc1e6fab6f2de8e9a0bfe4acc9db48b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea15b2520f57c3f0117f79e4058be85f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d4d47da18fd2a25fc78651b45ddb7e1c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_08f5e5a371f8e4222427dc0436cc1918 |
| publicationDate |
2006-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200627069-A |
| titleOfInvention |
Positive photosensitive siloxane composition, hardened film formed therefrom, and element having the hardened film |
| abstract |
The present invention provided a high sensitivity positive photosensitive siloxane composition having properties such as high heat resistance, high transparency, low dielectric constant and useful in the formation of a flat film for TFT substrates, an interlayer insulating film, or a core or clad material for light guide. The positive photosensitive siloxane composition comprises a siloxane polymer, a quinonediazido compound and a solvent, wherein hardend film of the composition has a light transmittance of 95% or more at a wavelength of 400 nm and a film thickness of around 3 μ m. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I557157-B |
| priorityDate |
2004-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |