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publicationDate 2006-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-200615282-A
titleOfInvention Polymer, resist protective coating material, and patterning process
abstract In an immersion lithography process, a pattern is formed by forming a photoresist layer on a wafer, forming a protective coating on the photoresist layer from an overlay material, exposing the layer structure to light in water, and developing. A water-insoluble, alkali-soluble material is used as the overlay material.
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