| abstract |
The present invention provides a transparent conductive film for constructing a transparent electrode that causes no residue, etc. by etching with a weak acid (for example, organic acid). Further, there is provided a sputtering target for producing the transparent conductive film. In particular, there is provided a sputtering target composed of indium oxide and cerium oxide, characterized in that in the observation of crystal peaks by X-ray diffractometry, the presence of peaks ascribed to indium oxide and cerium oxide is observed, and that in the EPMA measurement, the diameter of cerium oxide particles dispersed in indium oxide is measured as being less or equal to 5 mum. A transparent conductive film is formed by a sputtering technique with the use of this sputtering target. This transparent conductive film is substantially causes no residue, etc. by the etching with a weak acid (for example, organic acid). |