http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200537246-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2005-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6068319f9279ed74d41db69dc719c517 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4b4d423e3fa983b099420c2d380eaa75 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a6417c733f391adb9743a3708f94efe |
| publicationDate | 2005-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-200537246-A |
| titleOfInvention | Positive resist composition and resist pattern formation method |
| abstract | A positive resist composition having a high exposure margin, and an excellent resolution and dry etching resistance, and a pattern formation method using the positive resist composition are provided. The resist composition includes a resin component (A) which has an acid dissociable dissolution inhibiting group and increases alkali dissolvability by the action of an acid, and an acid generating agent component (B) which generates acid by exposure, the resin component (A) containing a first constituent unit (a1) represented by the following general formula (I), a second constituent unit (a2) which is derived from the unit represented by the general formula (I) wherein the hydroxyl group thereof is protected by replacing the hydrogen thereof with an acid dissociable dissolution inhibiting group represented by the following general formula (II), and a third constituent unit (a3) which is derived from the unit represented by the general formula (I) wherein the hydroxyl group thereof is protected by replacing the hydrogen thereof with an acyclic acid dissociable dissolution inhibiting group (III). |
| priorityDate | 2004-01-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 132.