http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200536825-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cf213be03285a0b93967ae2fd2fd351a |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C381-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12 |
| filingDate | 2005-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_053af871d1335648ab59a0629653e401 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6da5de48cb3207be5c46556808fa9b27 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_61e0f503da1e61302d621d6ba0a2c77f |
| publicationDate | 2005-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-200536825-A |
| titleOfInvention | Photoactive monomer, photosensitive polymer and chemically amplified photoresist composition including the same |
| abstract | Disclosed are a novel (meth)acrylic monomer having the function of a photoacid generator, a photosensitive polymer prepared with the monomer, and a chemically amplified photoresist composition including the polymer. The monomer having the function of a photoacid generator is represented by Formula 1, whenein R* is a hydrogen, methyl or CF3, R1 and R2 are independently a homo or hetero, saturated or unsaturated hydrocarbyl group having 1 to 25 carbon atoms. An- is an anion compound, and X1 and X2 are both hydrogen or are connected together to form a benzene ring. The monomer have a merit in that the photoacid-generator does not elute from a photoresist during wet exposing process in immersion lithography. Thus, the contaminations of lens and immersion fluid used in wet exposing process can be prevented or reduced. |
| priorityDate | 2004-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 143.