http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200534043-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1811 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2005-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_db5164e7933ae1378e0800168f386326 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e8c71d33c77b0cfbfdbf78e05c311a43 |
| publicationDate | 2005-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-200534043-A |
| titleOfInvention | Positive resist composition for immersion exposure and method for forming resist pattern |
| abstract | Discloses are a positive resist composition for immersion exposure and a method for forming a resist pattern. Specifically disclosed are a positive resist composition for immersion exposure with immersion resistance which is excellent in water blocking properties, and a method for forming a resist pattern using such a resist composition. The positive resist composition for immersion exposure contains a resin component (A) whose alkali solubility is increased by the action of an acid and an acid generator component (B) which generates an acid through exposure, and is characterized in that the resin component (A) includes at least an acrylate constitutional unit (a1) and a (meth)acrylate constitutional unit (a2) having an acid-cleavable dissolution inhibiting group and the constitutional unit (a1) is composed of a cyclic group bonded to the acrylate of the constitutional unit (a1) and a fluorinated organic group having a specific structure which is bonded to the cyclic group. |
| priorityDate | 2004-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 116.