| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31663
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-14 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-324
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02118
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02211
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-022 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-522
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 |
| filingDate |
2004-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9dda10a0dfb0879bc0808df5632c0e25 |
| publicationDate |
2005-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200531084-A |
| titleOfInvention |
Insulating film, method for forming same and composition for forming same |
| abstract |
A method of forming an insulating film of the invention includes: The method for forming the insulating film contains steps of forming a polysiloxane series insulating film on a substrate, forming a poly carbosilane series insulating film on the polysiloxane series insulating film, and forming an organic series insulating film on the poly carbosilane series insulating film. The polysiloxane series insulating film is formed by hydrolyzing and condensing at least one kind of a silane compound selected from a group of compounds represented by a general formula (1): RaSi(OR1)4-a, a general formula (2): Si(OR2)4, and a general formula (3): R<SP>3b</SP>(R4O)3-bSi-(R7)d-Si(OR5)3-cR6c, and the polycarbosilane series insulating film is formed by heating a coated film after coating a solution obtained by dissolving a polycarbosilane compound represented by a general formula (4) in a solvent. |
| priorityDate |
2003-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |