| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38ed56a4b4e8e2315b2b3308bffedb3f |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B7-0071
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67109
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32862 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate |
2004-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b6d023c99263ebf7547d58db9ff810db
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_48cfc2d957aaf402e0c0dd602e16dddc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a17742a06ba7aab616ff832b4a733b6b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1dbd37273019e5f6cd2b184be0c8da7a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cca9ae94bb317824a42f5afda8557e2c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_08c25e3a39bb003a4a3d1485ff385138
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d40fd1c723ff10e2e24e75ce70786159
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b0b05e648cc37cb131b3c242edf4eb9a |
| publicationDate |
2005-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200529285-A |
| titleOfInvention |
Pre-clean chamber with wafer heating apparatus and method of use |
| abstract |
A reactive pre-clean chamber that contains a wafer heating apparatus, such as a high-temperature electrostatic chuck (HTESC), for directly heating a wafer supported on the apparatus during a pre-cleaning process. The wafer heating apparatus is capable of heating the wafer to the optimum temperatures required for a hydrogen plasma reactive pre-clean (RPC) process. Furthermore, degassing and pre-cleaning can be carried out in the same pre-clean chamber. The invention further includes a method of pre-cleaning a wafer using a pre-clean chamber that contains a wafer heating apparatus. |
| priorityDate |
2004-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |