| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L3-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L9-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2309-00 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D3-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J3-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L101-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L21-00 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L3-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D3-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L101-00 |
| filingDate |
2001-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c5d56c6c033d9fd7b104c7056105aba
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_56001f6a1048383fd633d33d2ecd3cc3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_40cff46f16cd520c971adddcce092500 |
| publicationDate |
2005-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200528529-A |
| titleOfInvention |
Composition for polishing pad and polishing pad using the same |
| abstract |
An object of the invention is to provide a polishing pad having the excellent slurry retaining properties and the large removal rate and a composition for a polishing pad which can form such the polishing pad. A composition for polishing pad of the invention is comprising a water-insoluble matrix material containing a crosslinked polymer and a water-soluble particle dispersed in the water-insoluble matrix material. The elongation remaining after breaking is 100% or less when a test piece comprising the water-insoluble matrix material is broken at 80 DEG C according to JIS K 6251. At least a part of the polishing pad of the invention is composed of the composition for polishing pad above. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10391605-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10399201-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10537974-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10821573-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I574782-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10456886-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10953515-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10875145-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10875153-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11772229-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11446788-B2 |
| priorityDate |
2000-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |