| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2004-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da70f0ee751771143f8486e137fe5bfa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_00b457936ac3c94835cf21a95251d266
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_13814e23073e22d9eecdc7fb7d640788
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d2a6564d37d593cb43a9d727ba2ef3bf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_29407907a39a844a28ecb90f4f3aa9f9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6905dfe8fddb653e9dc31517dbe6027b |
| publicationDate |
2005-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200527137-A |
| titleOfInvention |
Resist composition and resist pattern formation method |
| abstract |
A resist composition having fine resolution, improved line edge roughness and improved depth of focus is provided. The resist composition includes a resin component (A) which increases alkali-solubility by an action of an acid, and an acid generating component (B) which generates acid on exposure, wherein the (A) component is a resin including a constitutional unit (a) derived from a (meth)acrylate ester and having a weight average molecular weight of 8000 or less, and the (B) component contains at least one kind of sulfonium compound represented by a following general formula (b-1) or (b-2). |
| priorityDate |
2003-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |