http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200523701-A

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filingDate 2004-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_62b4e041890f13629be3adae5a493357
publicationDate 2005-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-200523701-A
titleOfInvention System and method for using first-principles simulation to control a semiconductor manufacturing process
abstract A method, system and computer readable medium for controlling a process performed by a semiconductor processing tool includes inputting data relating to a process performed by the semiconductor processing tool, and inputting a first principles physical model relating to the semiconductor processing tool. First principles simulation is then performed using the input data and the physical model to provide a first principles simulation result, and the first principles simulation result is used to control the process performed by the semiconductor processing tool.
priorityDate 2003-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 22.