http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200521624-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6c8d4dc7bd1a30d8fda907fceaeb4e69 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031 |
| filingDate | 2004-09-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9aa26691c7ebb9860bd4ac4c3d0c9cc2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d6a6ba714d1a218f4470e9ac84cf1427 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a69f08ff1177c33a263a93d7f8db5a15 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3a3710018301de93ddf0851bd2e45b31 |
| publicationDate | 2005-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-200521624-A |
| titleOfInvention | Negative blue-violet laser photosensitive composition, image forming material, image former and method of image formation |
| abstract | A negative blue-violet laser photosensitive composition, which is highly sensitive to laser beams of blue-violet region and excels in not only safe light properties under a yellow light but also the resolution and rectangularity of obtained image, is provided in the present invention. Especially, the negative blue-violet laser photosensitive composition can appropriately be used as a dry film photoresist material and used in direct lithography by blue-violet laser beams. In addition, the image formation material using the negative blue-violet laser photosensitive composition, the image forming material, and method of image formation are provided in the invention. In particular, there is provided a negative blue-violet laser photosensitive composition wherein the minimum exposure intensity at which the exposure by blue-violet laser beams causes the residual film ratio to be 90% or higher is 40 mJ/cm<SP>2</SP> or less and wherein with respect to a residual film ratio-exposure intensity curve obtained by plotting the residual film ratio at exposed part [t(%)] against the logarithm of exposure intensity by blue-violet laser beams [logE(mJ/cm<SP>2</SP>)], the gamma value of straight line binding point at a residual film ratio of 15% with point at a residual film ratio of 80%, t = gamma logE + delta, is 4.0x10<SP>2</SP> or more. There are further provided, using the negative blue-violet laser photosensitive composition, an image forming material, image former and method of image formation. |
| priorityDate | 2003-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 507.