http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200518252-A

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filingDate 2004-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d601a59b8ea136b0c85d812361fd7db9
publicationDate 2005-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-200518252-A
titleOfInvention Test pattern for reliability measurement of copper interconnection line having moisture window and method for manufacturing the same
abstract Disclosed is a test pattern for a reliability measurement of a copper interconnection line having a moisture window and a method for manufacturing the same. The method includes the steps of: a first inter-layer insulation layer formed on the substrate; a plurality of bottom copper interconnection lines buried in the first inter-layer insulation layer; a second inter-layer insulation layer on the plurality of bottom copper interconnection lines and the first inter-layer insulation layer; a plurality of top copper interconnection lines filled in the second inter-layer insulation layer and connected to the plurality of bottom copper interconnection lines through the plurality of via contacts; and a passivation layer covering the plurality of top copper interconnection lines and having a plurality of moisture windows in which moistures are flown during an electro migration (EM) test.
priorityDate 2003-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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