http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200426519-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_44ff3005508304394801e265e503b811 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-68 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-50 |
| filingDate | 2004-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b938a102d57687dbfa5f0a07a3a7d085 |
| publicationDate | 2004-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-200426519-A |
| titleOfInvention | Method for producing mask blank and method for producing transfer mask |
| abstract | The present invention provides a mask blank which enables to suppress the formation of a bulge after the removal of a resist film on the peripheral portion of a substrate regardless of the kind of a resist species used therefor. In addition, the mask blank leaves no resist reside. In a removing step for unnecessary film in a mask blank production process, in which step an unnecessary resist film is removed from a substrate (10) on which a certain light-shielding film (12) is formed and then a resist film (13) is formed thereon, the substrate surface of a side on which the resist film (13) is formed is covered with a covering member (30), the unnecessary resist film is firstly dissolved by a chemical (50) while rotating the substrate (10) at a certain rotational speed (R1), the dissolved unnecessary resist film is then removed while rotating the substrate at a certain rotational speed (R2), and the region from which the resist is removed is dried while rotating the substrate at a certain rotational speed (R3). In this connection, (R1), (R2), and (R3) satisfy the following conditions: (I) R1 = 100-500 rpm, (II) R2 ≥ 300 rpm, and (III) R1 < R2 ≥ R3. |
| priorityDate | 2003-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 42.