| abstract |
This invention relates to a process for the production of etching or cleaning fluids characterized by comprising (1) at least one fluoride salt or hydrogen difluoride salt prepared from both at least one member selected from the group consisting of ammonia, hydroxylamines, aliphatic amines, aromatic amines, and aliphatic and aromatic quaternary ammonium salts, and hydrofluoric acid, (2) at least one organic solvent having a heteroatom, and (3) water, which comprises the step (1) of mixing an aqueous solution of hydrofluoric acid with at least one organic solvent having a heteroatom, and the step (2) of mixing the mixture obtained in the step (1) with either at least one member selected from the group consisting of ammonia, hydroxylamines, aliphatic amines, aromatic amines, and aliphatic and aromatic quaternary ammonium salts, or a fluoride salt thereof. |