| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C381-14 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C317-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C245-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2004-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5c5bd0a1d03685933a67bd0666edf50d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0fae1569bdd2e7a3c69ec6e378a4d433
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b735a8d83c8e9031effc2d561125bdc8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d52857b7f03c9e234813a25fd9306fb |
| publicationDate |
2004-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200421034-A |
| titleOfInvention |
Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process |
| abstract |
This invention provides a sulfonyldiazomethane compound characterized in having the chemical structure as shown in following formula (1). In the formula, R is a hydrogen atom or C1-C4 alkyl group or alkoxyl group; G is SO2 or CO; R3 is C1-C10 alkyl group or C6-C14 aryl group; p is 1 or 2; q is 0 or 1, satisfying p+q=2; n is 2 or 3; n' is 0 or 1; m is an integer of 3-11; and k is an integer of 0-4. The invented sulfonyldiazomethanes and the chemical amplification type resist composition using thereof comprise a specific sulfonyldiazomethane containing long-chain alkoxyl groups having many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term post exposure delay (PED), minimized debris left after coating, development and peeling, and improved pattern profile after development and is thus suited for microfabrication. |
| priorityDate |
2003-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |