| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45557
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28562 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
| filingDate |
2003-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cbe4bac17f0a1af705c4688f098ac2f8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cfba0211aafaddf8d9dd2afb0d7f744c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1f3c7f6c1d1e7355c33f019c21c0a0c8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_00bd01cc4f33b0c347e6c92559642e35
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d1216cd9e0b6675edb9350f77f7921df |
| publicationDate |
2004-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200406832-A |
| titleOfInvention |
Treating apparatus and method of treating |
| abstract |
In a treating apparatus, treating gases containing raw gases (TiCl4 and NH3) and inert gas (N2) are fed into treating vessel (2). The internal pressure of the treating vessel (2) is detected by means of pressure gauge (6), and the flow rates of treating gases fed into the treating vessel (2) are controlled on the basis of detection results. Purging of raw gases is performed with inert gas. The total flow rate of treating gases is controlled by fixing the flow rates of raw gases and controlling the flow rate of inert gas, so that the internal pressure of the treating vessel (2) is maintained constant. The time required for discharging of raw gases can be shortened, so that the time for switching of raw gases can be shortened. Further, the temperature of substrate surface during the treating can be maintained constant. |
| priorityDate |
2002-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |