| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B49-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B49-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B49-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B49-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B49-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B49-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-005 |
| filingDate |
2003-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_58e169d9e9f6bada172663ee91cb940b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d8d787a1a28d9c496ac5be4e7d1be62d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_34b033a8a01a43c59089feb5b2dd43e6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_44f0356f04da9164efbaea2afc08994c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0cb805a58bba6d470c885dcab58f5b54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3591cb4617fbd1fcf0b08b5a82bb0029 |
| publicationDate |
2004-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200406284-A |
| titleOfInvention |
Apparatus and methods for detecting transitions of wafer surface properties in chemical mechanical polishing for process status and control |
| abstract |
In chemical mechanical polishing apparatus, a wafer carrier plate is provided with a cavity for reception of a sensor positioned very close to a wafer to be polished. Energy resulting from contact between a polishing pad and an exposed surface of the wafer is transmitted only a very short distance to the sensor and is sensed by the sensor, providing data as to the nature of properties of the exposed surface of the wafer, and of transitions of those properties. Correlation methods provide graphs relating sensed energy to the surface properties, and to the transitions. The correlation graphs provide process status data for process control. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I381906-B |
| priorityDate |
2002-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |