| abstract |
It is an object of the present invention to provide a high order silane composition that contains a polysilane having a higher molecular weight than the conventional from the viewpoints of wettability when applying onto a substrate, boiling point and safety, and hence in particular enables a high-quality silicon film to be formed easily, and also a method of forming an excellent silicon film using the composition. In detail, the present invention provides a high order silane composition, which is characterized in that the high order silane composition obtained through photopolymerization by irradiating a solution of a photopolymerizable silane or a phtopolymerizable silane liquid with ultraviolet light to solve the above-mentioned subject. Moreover, the present invention also provides a method of forming silicon film, characterized in that the high order silane composition is coated onto a substrate. |