| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5a2c13cd8c31895cdcd8a5a8c17adea8 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C2071-025
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31855
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C2071-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D3-0254
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C2071-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-269
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3127
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31544
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G2261-3424
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-3154 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31058
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0212
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J5-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G61-025
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C71-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G61-02 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C71-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G61-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-24 |
| filingDate |
2003-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d8201ffc5fb78c01e20e244fdc01f4f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_77b2817f193d9b9f991fbae09510b1d7 |
| publicationDate |
2003-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200304960-A |
| titleOfInvention |
Chemically and electrically stabilized polymer films |
| abstract |
Preparation methods and stabilization processes for low k polymers that consist of sp2C-X and HC-sp3Cα-X bonds. A preparation method is achieved by controlling the substrate temperature and feed rate of the polymer precursors. One stabilization process includes a post annealing of as-deposited polymer films under the presence of hydrogen under high temperatures. The reductive annealing of these films is conducted at temperatures from -20 DEG C to -50 DEG C to +20 DEG C to +50 DEG C of their Reversible Crystal Transformation ("CRT") temperatures, then quenching the resulting films to -20 DEG C to -50 DEG C below their "CRT" temperatures. The reductive annealing is conducted before the as-deposited film was removed from a deposition system and still under the vacuum. "Re-stabilization" processes of polymer surfaces that are exposed to reactive plasma etching are also disclosed; thus, further coating by barrier metal, cap layer or etch-stop layer can be safely applied. |
| priorityDate |
2002-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |