| abstract |
A cleaning composition and method for removing built-up residue and scum on a substrate. The cleaning composition contains a compound of formula: R-[O-(AO)n]m-Z Where R is a hydrophobe, AO is a hydrophile, Z is a nonionic or anionic capping group, n is an integer of from 1 to 200 and m is an integer of from 1 to 3. The cleaning composition and method is effective for removing built-up residue and scum deposited by both positive-working photoresist and negative-working photoresist. Such residue and scum contain photoinitiators, dyes, and (meth) acrylic monomers. |