http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200304052-A

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filingDate 2003-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3822e0e397a1cfba32c00b5202588f61
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publicationDate 2003-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-200304052-A
titleOfInvention Substrate processing apparatus and substrate processing method
abstract A common solvent vapor supply source 41 and a common processing gas supply source 42 supply ozone gas and steam to a plurality of processing vessels 30A, 30B. Pressures in the processing vessels are regulated by adjusting the openings of the valuable throttle valves 50A, 50B, which are placed in exhaust lines 80A, 80B, respectively.
priorityDate 2002-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 26.