Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1e70c0aeade92d7571d955d3b90ea06e |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C19-08 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C19-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C10M101-00 |
filingDate |
2003-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d65412e55e7778c4a4f09b9c0c7a2e37 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_357689aa121fa0a64b793ced529bc156 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d3a30ee56fed250bc50f1f6f0f265b21 |
publicationDate |
2003-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-200304044-A |
titleOfInvention |
Radiation durable organic compounds with high transparency in the vacuum ultraviolet, and method for preparing |
abstract |
This invention concerns radiation durable organic compositions which are well-suited for use in 157 nm lithography by virtue of their high transparency and excellent radiation durability, and to a process for the preparation thereof. |
priorityDate |
2002-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |