| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-287 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-28 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate |
2003-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_642e6c1d9368f1e4a8c9a6ea48254426
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7b31342132725f8d0205b74b745a3d18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a4e5f5dd57db73f409d7bb959ef2cb84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6c0a881a4abdca96e548c3555c1cb8a1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7ee9dcbfcf37def4af1a5122fef33329
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f54ced330687db8d6154a159f6ed8bd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8ec86aa42c6b320e4f912508e8f40624 |
| publicationDate |
2003-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200303895-A |
| titleOfInvention |
Photosensitive resin composition |
| abstract |
This invention provides a photosensitive resin composition having good hydrolysis characteristic and suited for use as a solder resist composition. The resin composition of this invention can be photo-cured to become a hardened film which is electrolytic corrosion proof and heat-shock proof. It is suited for use as a solder resist composition having a high photo-sensitivity and a high solvent resistance. The photosensitive resin composition comprises: (A) (a) a polyester (meth) acrylate which is obtained by esterization by dehydration and condensation of polyester polyol with (meth) acrylic acid, wherein the polyesterpolyol is obtained by polycondensation reaction of (a) dihydric alcohol with (b) diabasic acid; (B) a photo-sensitive resin having a carboxyl group, and (C) photo initiator. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104428322-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104428322-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I424266-B |
| priorityDate |
2002-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |