http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200302160-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d5d04736b0b882a4f5a1e0e0e4cd8cbb |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25F3-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01G9-04 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01G9-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25F3-04 |
| filingDate | 2003-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5f131339aebc15c0b6650ad8fdafe6b7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_68475bd0909f099a298bc37f134a6993 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_369e9c7378be776fef705550b2fa90ad http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57eadc89a48e8177be5e74b4cbca792c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f580bfab6342a1e55e82eea13c7d6750 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9e153e152b3e0ae138a6782a0ba9fe72 |
| publicationDate | 2003-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-200302160-A |
| titleOfInvention | Composite metal material and production method therefor, etched metal material and production method therefor, and electrolytic capacitor |
| abstract | The present invention claims the priority of Japanese Patent Application No. 2002-17468 filmed on January 24, 2002 and US Patent Application No. 60/358,372 which are cited for reference as part of the present invention. A composite metal material (1) in accordance with the present invention used as an electrolytic capacitor electrode-use material, comprises a high molecular polymer thin film (11) formed by self-organizing on at least one surface of a metal material substrate (10) and having fine patterns (12). This high molecular polymer thin film (11) is formed by drying the hydrophobic organic solvent solution of a polymer compound. Etching this composite metal material (1) forms etching pits distributed uniformly at high density based on the above fine patterns. |
| priorityDate | 2002-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 44.