| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2002-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7647986d1616fdf05548b15590d92700
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_570594917b2befdc87476b2702101249
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b240077b94d3e009a7ab327371166123 |
| publicationDate |
2003-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200301403-A |
| titleOfInvention |
Positive photoresist composition |
| abstract |
The present invention provides a positive photoresist composition having an excellent sensitivity and a rough density applied in i-line beams. It comprises (A) dissolvable alkali resin, and (B) the composition formed of the chemical compound (b1) of the formula below and the chemical compound (b2) of the formula below such as the quinine di-azid ester compound of (2-methyl group-4-alkyl group-5-cyclohexylphenyl group)-3, 4-dialkylphenylmethane (in the formula, D is hydrogen atom or naphthalene quinine di-azid group sulfonyl group). |
| priorityDate |
2001-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |