http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200300871-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28 |
| filingDate | 2002-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_efa468b361066689cdf41ee3391659d7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de9c993ed66f82baae6aa97500ecf35e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6905dfe8fddb653e9dc31517dbe6027b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_75c5e7896cd81053eae8dc081ae85e2d |
| publicationDate | 2003-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-200300871-A |
| titleOfInvention | Positive photoresist composition and forming method for resist pattern |
| abstract | A positive type resist composition and a method for forming a resist pattern using the same, the positive type resist composition comprising a resin component (A) which has increased solubility towards an alkali as the result of the action of an acid, and which has on a main chain only units derived from an acrylic ester, an acid generating component (B), and an organic solvent component (C); and resin component (A) is a copolymer comprising a structural unit (al) comprising, on a side chain, a polycyclic acid dissociation solution control group which separates more easily than a 2-methyl-2-adamantyl group, a structural unit (a2) comprising, on a side chain, a polycyclic group comprising a lactone, and a structural unit (a3) comprising, on a side chain, a polycyclic group having a hydroxyl group. This composition is a chemical amplification type positive type resist composition onto which, when using a light source with a wavelength of 200 nm or less, a microscopic resist pattern can be applied, which shows excellent sensitivity and resolution, with low surface roughness and line edge roughness and at the time of etching, and when observed by a scanning electron microscope has low line slimming. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7361447-B2 |
| priorityDate | 2001-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 82.