http://rdf.ncbi.nlm.nih.gov/pubchem/patent/SG-185033-A1

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8d134eb79512ea6464bb92963fc5bb6f
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B44C1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-00
filingDate 2011-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d260ed63bd0a6c4d87a14284b3075d3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f45c08298a6d6bf1f0b78c1d4f817f83
publicationDate 2012-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber SG-185033-A1
titleOfInvention Sapphire polishing slurry and sapphire polishing method
abstract Disclosed is a polishing slurry for sapphire polishing that is capable of obtaining polishing speeds and smooth surfaces during the polishing of sapphire substrates that are equivalent to or better than in prior polishing processes even if the number of polishers and polishing hours are reduced. Also disclosed is a sapphire substrate polishing method. The slurry includes alumina abrasives and has a pH adjusted to the range of 10.0 to 14.0, and the sapphire is polished by means of the CMP technique by applying said slurry. The aforementioned alumina abrasives more preferably include at least α-alumina, and the content thereof is more preferably 0.01 to 50 wt%. The mean particle size of the aforementioned alumina abrasives is preferably 0.05 to 10 μm.
priorityDate 2010-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
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http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID9989226

Total number of triples: 18.