http://rdf.ncbi.nlm.nih.gov/pubchem/patent/SG-182888-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b828305495e1cdb63947a3a18aa633d1 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-281 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-282 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-56 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F232-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L45-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-405 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-265 |
| filingDate | 2011-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9a68bdb4a8c92fefcdc281ba8ba4268 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_95786aa73eca78f71b4aa9d946005b45 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a5901942fdf170b90a3ebba83af50a81 |
| publicationDate | 2012-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | SG-182888-A1 |
| titleOfInvention | Water-soluble resin composition and method of forming fine patterns by using the same |
| abstract | WATER-SOLUBLE RESIN COMPOSITION AND METHOD OF FORMING FINE PATTERNS BY USING THE SAMEA water-soluble resin composition for forming fine patterns comprising water-soluble polymer represented by Chemical Formula 1 as below and the First water-soluble solvent, is coated and heated on a photoresist layer having at least one contact hole to reduce a size of the at least one contact hole.[err] (1)(In Chemical Formula 1,each of R[err], R[err], R[err] and R[err] independently represents an alkyl group of C[err] or an cyclo alkyl group of C[err] which respectively have one selected from the group consisting of hydrogen, an ether group, an ester group, a carbonyl group, an acetal, an epoxy group, a nitril group, an amine group, and an aldehyde group;each of R[err], R[err], R[err] and R[err] independently represents hydrogen or a methyl group; n represents an integer of 0 to 5;a represents a real number of 0.05 to 0.5;each of b, c and d respectively represents a real number of 0 to 0.7; and a+b+c+d= 1 ) |
| priorityDate | 2011-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.