| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c389d310f52125a947b3408cb0cf3283 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D3-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D11-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D11-001 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29K75-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29K105-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29L31-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29L31-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C39-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D11-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D3-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-24 |
| filingDate |
2007-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c6af24fdb8219411ad475d443dbcfb5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d7943d9221081c8cbd8803a80b749f2f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d6790857370b6cb585773ebc260df0b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ce2da415f3775c1c83e309faf6d0f92a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_44d9121ba4a3712fabedbba2aea5bfa8 |
| publicationDate |
2012-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
SG-177964-A1 |
| titleOfInvention |
Polishing pad and method for producing the same |
| abstract |
An object of the invention is to provide a polishing pad excellent in durability and in the adhesiveness between a polishing layer and a base material layer. The first invention relates to a polishing pad comprising a polishing layer arranged on a base material layer, wherein the polishing layer comprises a thermosetting polyurethane foam having roughly spherical interconnected cells having an average cell diameter of 20 to 300 µm, the polyurethane foam comprises an isocyanate component and an active hydrogen-containing compound as starting components, and the active hydrogen-containing compound comprises 30 to 85% by weight of a high-molecular-weight polyol having 2 to 4 functional groups and a hydroxyl value of 20 to 100 mg KOH/g.Figure: 1 |
| priorityDate |
2007-01-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |