| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8e0bf0928b608797b70bbc2b91c7e52e |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-40 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2885
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76877 |
| filingDate |
2010-07-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b056dd29b3d47305039012674a17c80c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a307d0fdecad754d3692029fdc3cd86d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a62263953f7ab982abdb9b42161aa7f0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dc8b6ea3e4c83f4f1ed5da841ba8ce15
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a29fb5445b324a5305980a37958ae85a |
| publicationDate |
2012-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
SG-177418-A1 |
| titleOfInvention |
Composition for metal plating comprising suppressing agent for void free submicron feature filling |
| abstract |
A composition comprising at least one source of metal ions and at least one additive obtainable by reacting a polyhydric alcohol comprising at least 5 hydroxyl functional groups with at least a first alkylene oxide and a second alkylene oxide from a mixture of the first alkylene oxide and the second alkylene oxide or a third alkylene oxide, a second alkylene oxide, and a first alkylene oxide in aforesaid sequence, the third alkylene oxide having a longer alkyl chain than the second alkylene oxide and the second alkylene oxide having a longer alkyl chain than the first alkylene oxide. |
| priorityDate |
2009-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |