| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8e0bf0928b608797b70bbc2b91c7e52e |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D7-123
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-423 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2885
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76877
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-32 |
| filingDate |
2010-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dc8b6ea3e4c83f4f1ed5da841ba8ce15
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b056dd29b3d47305039012674a17c80c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a307d0fdecad754d3692029fdc3cd86d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a29fb5445b324a5305980a37958ae85a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a62263953f7ab982abdb9b42161aa7f0 |
| publicationDate |
2011-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
SG-174393-A1 |
| titleOfInvention |
Composition for metal plating comprising suppressing agent for void free submicron feature filling |
| abstract |
Composition comprising a source of metal ions and at least one suppressing agent obtainable by reacting a) an amine compound comprising at least three active amino functional groups with b) a mixture of ethylene oxide and at least one compound selected from C3 and C4 alkylene oxides. |
| priorityDate |
2009-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |