http://rdf.ncbi.nlm.nih.gov/pubchem/patent/SG-11201807282S-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ccfee51074117c6961593015b14f0dd9 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-80 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-26 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L101-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-5415 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L43-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0212 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L101-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-235 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-016 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-04 |
| filingDate | 2017-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c8edea28dd89236a9ce49082f5b02156 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3da478d60dc739fc7b1d8fcb8318b1bf http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_defe82a5a775d546a5d59dfc8ced8475 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f981c64c0555b07acc2bbc93db28cf22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_82eab02038377692e8cf5b7d4822462b |
| publicationDate | 2018-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | SG-11201807282S-A |
| titleOfInvention | Photosensitive siloxane composition |
| abstract | INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property -, Organization 111111110111101110101011111010111110111011111010111111111011011111101111011111 International Bureau 0.. .... .. (10) International Publication Number (43) International Publication Date ..... ..or::,„, WO 2017/162831 Al 28 September 2017 (28.09.2017) WIP0 I PCT (51) International Patent Classification: (74) Agent: B2B PATENTS; Merck Patent GmbH, 64271 C08L 83/04 (2006.01) CO9D 183/04 (2006.01) Darmstadt (DE). (21) International Application Number: (81) Designated States (unless otherwise indicated, for every PCT/EP2017/057005 kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, (22) International Filing Date: 23 March 2017 (23.03.2017) BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, (25) Filing Language: English HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, (26) Publication Language: English MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, (30) Priority Data: 2016-062385 25 March 2016 (25.03.2016) JP NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, (71) Applicant: AZ ELECTRONIC MATERIALS (LUX- ZA, ZM, ZW. EMBOURG) S.A.R.L. [LU/LU]; 46 Place Guillaume II, 1648 Luxembourg (LU). (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, _ (72) Inventors: TAKAHASHI, Megumi; c/o Merck Perform- ance Materials Ltd., 3330 Chihama, Kakegawa-shi, Shizuoka, 437-1412 (JP). YOKOYAMA, Daishi; c/o Mer- ck Performance Materials Ltd., 3330, Chihama, Kakegawa- shi, Shizuoka, 437-1412 (JP). YOSHIDA, Naofumi; c/o GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, — _ Merck Performance Materials Ltd., 3330, Chihama, Kakegawa-shi, Shizuoka, 437-14112 (JP). TANIGUCHI, Katsuto; c/o Merck Performance Materials Ltd., 3330, Chihama, Kakegawa-shi, Shizuoka, 437-1412 (JP). KUZ- SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: AWA, Masahiro; c/o Natoco Co., Ltd., 8-3 Futano-cho, Mizuho-ku, Nagoya-shi, Aichi, 467-0861 (JP). — with international search report (Art. 21(3)) = = = = = = = = = 1-1 Il M GC ei 1-1 (54) Title: PHOTOSENSITIVE SILOXANE COMPOSITION 1-1 C (57) : [] To provide a composition capable of forming a cured film having low permittivity and excellence in chemic - N al resistance, in heat resistance and in resolution; and further to provide a production process employing the composition. [Means] en. ) The present invention provides a composition comprising : an alkali-soluble resin, namely, a polymer comprising a carboxyl-con- taining polymerization unit and an alkoxysilyl- containing polymerization unit; a polysiloxane; a diazonaphthoquinone derivative; a compound generating acid or base when exposed to heat or light; and a solvent. |
| priorityDate | 2016-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 41.