| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_75750aafb2142261c702b868240c0c9b |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30604
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02598
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B29-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B33-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3225
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3221
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-324
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B33-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B33-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B33-005 |
| filingDate |
2017-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_26100503a7058eb9c34be70574fbd475
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ba40f8a88ddfa3abde74a6573feebb34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da643156a69eba491c038ff4bac4d02b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1b89a2174a263a77d7c6b994a3b2152f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_73b9d476eb5bd04b858411c7fa0e3d31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2043feb01e9eb169794037017754ee90
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c9b29b9094a43416113edfcf00632e3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_79a74a7aacac796c98b3350e61ddea7b |
| publicationDate |
2020-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
SG-10201913071X-A |
| titleOfInvention |
Method of treating silicon wafers to have intrinsic gettering and gate oxide integrity yield |
| priorityDate |
2016-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |