| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b051f9f7933c758e66f6ceda5c9fb2cc |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32134
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02063
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144 |
| filingDate |
2014-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8935a3c7ca54e3de106999ae0708fee9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_52d3ba3823cf506c6a4a1cd31cf804c4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_949da389ec28413371b3b5ef353a0581
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fffc6c3637b80b813bc740a90918c547
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_324163bfd9752910beeeecb080667620
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2836c352a91a0f65b8c825901a57d3d3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_67ebb6e7f36aeebc074bb2bedfed6087 |
| publicationDate |
2015-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
SG-10201408200Q-A |
| titleOfInvention |
Composition for titanium nitride hard mask and etch residue removal |
| priorityDate |
2013-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |