http://rdf.ncbi.nlm.nih.gov/pubchem/patent/RU-82349-U1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2008-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2009-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2009-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | RU-82349-U1 |
| titleOfInvention | PHOTO RESIST FOR NANOLITHOGRAPHY |
| abstract | The utility model relates to photoresists for nanolithography and can be used in photolithographic processes when working in deep and extreme ultraviolet and soft x-rays. The objective of the utility model is to provide higher resolution when operating the photoresist in the short-wavelength ranges (at wavelengths of deep, extreme ultraviolet (GUF and EUV) and soft X-ray (MR)) and to increase the resistance of the micrograph shown in the photoresist. The problem is solved by a photoresist for nanolithography, which is a multilayer thin film coating of a flat sample plate, characterized in that the main photosensitive layer of inorganic material with a thickness of the order of the specified minimum lateral size a min created on the surface of the sample of the micrograph element is applied over a relatively thick organic planarizer, on which, in turn, a layer of metal or a semiconductor inert to an ion-plasma tracer is deposited phenomenon. In this case, when operating in deep ultraviolet (100-250 nm), an immersion layer of a material (plastic) transparent at the wavelength of actinic radiation with a high refractive index (n≥1.5) and a thickness of this layer is greater than the wavelength is applied over the multilayer structure of the photoresist actinic radiation, equipped with a thin (less than the wavelength of actinic radiation) adhesive layer, glued (then peeled off after exposure) on a semiconductor wafer. |
| priorityDate | 2008-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 19.