| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c7fada561413fe96444fd3c6bfa206ec |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-12 |
| filingDate |
2018-02-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2019-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8d622f80f18762d088ad354e4d876356
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_afd07e4bd0f3c103cdd6c45e4351a3b4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8254d44a93980d3fe5f902c4ad268149
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_878c1edf8d638d4e4c32d75cd6706d94
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_90c53a0f056255fa96a467847f4446ac
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_50bb2b47932bdce1b8723d6d7b08ae6f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3fb4c70e654c913fd6faa0d33c4c3b46 |
| publicationDate |
2019-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
RU-2677493-C1 |
| titleOfInvention |
Alkylphenol-formaldehyde film-forming resins for photoresists |
| abstract |
FIELD: physics; chemistry. n SUBSTANCE: invention relates to film-forming for photoresists based on alkylphenol-formaldehyde resins. Film-forming component for alkylphenol-formaldehyde resin based photoresists is obtained by condensation of an alkylphenol mixture and formaldehyde in the presence of benzenesulfonic acid as an acid catalyst in an acetic acid medium as an organic solvent when heated, followed by separation of the resin to 5–10 °C cooled distilled water, coke-chemical fractions dicresol and tricresol are used as monomers, the monomer/formaldehyde molar ratio is 1/(0.57–1). n EFFECT: technical result is the expansion of the raw material base for the synthesis of the film-forming component. n 1 cl, 2 tbl |
| priorityDate |
2018-02-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |