http://rdf.ncbi.nlm.nih.gov/pubchem/patent/RU-2661320-C1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bf5cf50f0da644d031738da93d44061a |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-0227 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45593 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 |
| filingDate | 2017-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2018-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a16e382b190b8513ddfa974ae2163ed7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_30e827c55cf1aef8dfe15d93073cc290 |
| publicationDate | 2018-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | RU-2661320-C1 |
| titleOfInvention | Method of substrate hydrophobisation |
| abstract | FIELD: technological processes. n SUBSTANCE: present invention relates to a method for hydrophobizing a surface of substrates and can be used in gas-bearing systems for sampling and storing natural gas samples for preparation of a substrate, for example a gas storage vessel and a supply conduit, in production quality control systems in the oil and gas industry, in chemical analytical laboratories, in the production of analytical instruments and chromatographs, in commercial metering sites, in systems for measuring the quantity and quality of gas and liquefied petroleum gases on main gas pipelines. Method for depositing an amorphous silicon coating on a substrate comprises a) preparing at least one substrate surface in which at least one substrate surface is cleaned with an organic solvent at a temperature of from 25 °C to 35 °C, said at least one surface of the substrate is treated with a solution of a mineral acid at a temperature of from 20 °C to 30 °C, drying said at least one surface of the substrate in an inert gas atmosphere at a temperature of from 200 °C to 300 °C, b) depositing amorphous silicon on at least one surface of the substrate, comprising feeding the silicon precursor in an inert gas atmosphere and decomposing the silicon precursor at a temperature of from 600 °C to 1,000 °C for 3 to 240 minutes, to form an amorphous silicon layer on the at least one surface of the substrate. n EFFECT: provides a more uniform coating with a high value of contact angle of wetting, increased strength and reliability to mechanical action, which increases the overall efficiency of the hydrofobisation process. n 18 cl, 3 ex |
| priorityDate | 2017-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 52.