| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3b36a5850b17cfedb863448fd17a9e37 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2251-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2251-604
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2251-104
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2258-0283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2251-606
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2257-308
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2257-404
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2257-602
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2257-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2257-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2256-22 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-79
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B32-50 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B32-50 |
| filingDate |
2011-06-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_946bb9f6971f859577a52e0377332ee1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7aa0c9fa9570951358763d68bc89a3a6 |
| publicationDate |
2016-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
RU-2573677-C2 |
| titleOfInvention |
Device and method for gas flow cleaning |
| abstract |
FIELD: process engineering. n SUBSTANCE: invention relates to removal of contaminants from the gas flow. This method comprises the steps that follow. (a) Gas flow is forced into reaction chamber of gas tower washer. (b) The first contaminants are oxidized in liquid phase by reactive elements in the tower washer manifold that make the oxidizing solution. (c) The second contaminants are oxidized in gas flow gas phase above the excess reactive elements manifold, said elements releasing from oxidizing solution in the manifold. (d) The oxidation and washout of the third contaminants in the liquid-gas contact located above the gas flow. n EFFECT: higher efficiency of cleaning. n 23 cl, 4 dwg |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/RU-2686037-C1 |
| priorityDate |
2010-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |